Wet Process Equipment
Wet chemical solutions are the preferred method for etch and cleaning wafers in many semiconductor processes. Wet bench, CMP and hot DI water applications present challenges in an environment that has potential for wafer contamination and process variations that may cause defects and safety concerns. To meet the demands of wet process applications Watlow has developed a family of thermal components for acid, water, CO2, air and solvent applications.
Thick film quartz heating technology, because of its fast response, cleanliness and low external temperature is the foundation of what is rapidly becoming the industry's preferred method of heating chemicals.
Related Literature, News and Downloads
Click on the below links for more product information. PDF documents require Adobe® Reader® version 7 or higher for viewing.
| Specification Sheets & Brochures | Size/Pages |
|---|---|
| Semiconductor Processing | 1,927K / 36 (PDF) |
| EHG SL10 Process Controller and Safety Limit | 2,037K / 4 (PDF) |
| Thick Film Quartz Heater Modules | 209K / 8 (PDF) |
| Cable/Coil Heaters | 84K / 2 (PDF) |
| RELIALINE™ 170 Heating System | 243K / 2 (PDF) |
| Related News Releases and Newsletters | Date |
|---|---|
| Interference Fit Construction Heaters from Watlow® Improve ... | 15-Jul-2008 |
| Large Thick Film Heaters from Watlow® Improve Temperature ... | 15-Jul-2008 |
| Watlow Opens a Semiconductor Technology Design Center | 12-Jul-2007 |
| Related Technical Documents | Size/Pages |
|---|---|
| PPC-2000 User Guide | 2,515K / 320 (PDF) |
PDF documents require Adobe® Reader® version 7 or higher for viewing.
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